Particle Induced X Ray Emission – PIXE

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PIXE is a non-destructive, elemental analysis technique widely used for trace element and multi-element analysis.


Particle Induced X-Ray Emission

PIXE is a non-destructive, elemental analysis technique widely used for trace element and multi-element analysis. When charged particles collide with target atoms of a specimen, X-rays characteristic of the elements present in the sample are emitted and detected by the high-resolution silicon detector. PIXE has a high sensitivity for elements from Sodium to Uranium (ppb~ppm). It is used to analyze a diverse range of specimens, including air filters, semiconductor wafers, archeological artifacts, crystalline, and liquid proteins, thin films, coatings, food, biological samples, etc.

Ion beam sources in PIXE can be configured for specific applications. Scanning ion beams are used to obtain a 2D elemental distribution, and micro ion beams are used for the focused micron-scale analysis of samples. PIXE is also a complementary technique to RBS (Rutherford Backscattering Spectroscopy) and is widely used together for heavy element identification in materials.

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    FAQs on Particle Induced X Ray Emission – PIXE

    Where Can I Do Particle Induced X-Ray Emission (PIXE) Analysis Of Materials?

    Our network of testing labs regularly provides particle induced X-ray emission (PIXE) material analysis services.

    What Is Particle Induced X-Ray Emission (PIXE) Used For?

    particle induced X-ray emission (PIXE) is a great tool for simultaneous elemental analysis of solid, liquid, or thin-film samples. It is a preferred method for its minimal to no sample prep required and fast testing times. PIXE systems have also been employed in QA/QC programs with proper instrument calibrations in place.

    What can particle induced X-ray emission (PIXE) detect?

    Particle induced X-ray emission (PIXE) can detect elements from Sodium through Uranium in solid, liquid, and aerosol filter samples.

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