PIXE is a non-destructive, elemental analysis technique widely used for trace element and multi-element analysis.
Particle Induced X-Ray Emission
PIXE is a non-destructive, elemental analysis technique widely used for trace element and multi-element analysis. When charged particles collide with target atoms of a specimen, X-rays characteristic of the elements present in the sample are emitted and detected by the high-resolution silicon detector. PIXE has a high sensitivity for elements from Sodium to Uranium (ppb~ppm). It is used to analyze a diverse range of specimens, including air filters, semiconductor wafers, archeological artifacts, crystalline, and liquid proteins, thin films, coatings, food, biological samples, etc.
Ion beam sources in PIXE can be configured for specific applications. Scanning ion beams are used to obtain a 2D elemental distribution, and micro ion beams are used for the focused micron-scale analysis of samples. PIXE is also a complementary technique to RBS (Rutherford Backscattering Spectroscopy) and is widely used together for heavy element identification in materials.
Infinita Lab provides Particle Induced X Ray Emission – PIXE Laboratory Services in California, USA. Check more testing services at infinitalab.com.
