Dual Beam – Focused Ion Beam (Dual Beam – FIB)

Dual Beam - Focused Ion Beam (Dual Beam - FIB) uses a focused ion beam (usually Gallium) for nano-scale milling or sputtering of samples with simultaneous SEM imaging of the modified area. The Dual Beam-FIB technique has many applications in emerging semiconductor and nano-technology sectors and all the tests related to this technique are offered by Infinita Lab network of testing labs, USA, to our clients.

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Overview
Scope, Applications, and Benefits
Test Process
Specifications
Instrumentation
Results and Deliverables

Overview

Dual Beam – Focused Ion Beam (FIB) is a sophisticated microscopy technique that incorporates a focused ion beam and a scanning electron microscope (SEM) in a single tool. With this tool, precise material removal and cross-sectioning of micro and nanostructures are possible.

Dual beam Focused Ion Beam tools are utilized in various applications, ranging from materials and semiconductor analysis to nanotechnology and failure analysis. The tool is utilized to mill or modify a material’s surface with an ion beam and to provide detailed imaging of structures with an electron beam.

Scope, Applications, and Benefits

Scope

Dual Beam FIB analysis enables precise material removal, cross-section preparation, and nanoscale imaging for detailed structural investigation. The technique is particularly useful for examining internal structures and performing site-specific sample preparation.

The scope includes:

Micro and nanoscale material modification
Cross-section preparation of samples
Imaging of internal microstructures
Analysis of semiconductor and electronic devices
Preparation of TEM lamella samples

Applications

Semiconductor device failure analysis
Nanotechnology and microelectronics research
Materials science investigations
Microstructure and interface analysis
TEM sample preparation

Benefits

Enables precise nanoscale milling
Provides high-resolution imaging
Allows site-specific sample preparation
Combines imaging and machining in one system
Supports advanced materials characterization

Test Process

Sample Preparation

The specimen is mounted and positioned in the dual beam chamber for analysis.

Ion Beam Milling

A focused ion beam removes material from the sample to expose internal structures or prepare cross-sections.

Electron Beam Imaging

The scanning electron beam captures high-resolution images of the exposed surfaces.

Data Analysis

The images and structural information are analyzed to evaluate material properties or detect defects.

Technical Specifications

Parameter	Details
Technique Type	Dual beam microscopy
Ion Source	Gallium ion beam
Imaging Method	Scanning electron microscopy
Resolution	Nanometer-scale imaging capability
Operation Mode	Milling, imaging, and sample preparation

Instrumentation Used for Testing

Dual Beam FIB-SEM System
Focused Ion Beam Source
Scanning Electron Microscope (SEM)
Sample Stage and Chamber
Image Processing Software

Results and Deliverables

High-resolution microstructure images
Cross-sectional analysis reports
Defect and failure analysis results
Nanoscale structural characterization
Detailed technical analysis repor

Why Choose Infinita Lab for Dual Beam – FIB?

With Infinita Lab (www.infinitalab.com), you are guaranteed a Nationwide Network of Accredited Laboratories spread across the USA, the best Consultants from around the world, Convenient Sample Pick-Up and Delivery, and Fast Turnaround Time.

Our team understands the stakes and subtleties of every test. Whether you’re validating a new Product, de-risking a prototype, or navigating complex compliance requirements, our specialists guide the process with rigor and clarity.

Looking for a trusted partner to achieve your research goals? Schedule a meeting with us, send us a request, or call us at (888) 878-3090 to learn more about our services and how we can support you. Request a Quote

Frequently Asked Questions

Dual Beam FIB is an advanced microscopy technique that combines a focused ion beam for precise material removal with a scanning electron microscope for high-resolution imaging and nanoscale structural analysis.

The focused ion beam is used to mill, cut, or remove material from a sample surface, enabling researchers to expose internal structures and prepare precise cross-sections for analysis.

Unlike a conventional SEM, Dual Beam FIB systems include both an ion beam and an electron beam, allowing simultaneous material modification and high-resolution imaging within the same instrument.

Dual Beam FIB enables precise cross-sectioning of microelectronic devices, allowing engineers to examine internal layers, detect defects, and investigate failures in semiconductor components.

Dual Beam FIB systems provide nanoscale resolution imaging and precise material removal, enabling researchers to study microstructures and defects at extremely small dimensions.