Dual Beam FIB SEM Testing Services

Accredited dual beam FIB SEM testing from Infinita Lab, performed to the exact standard requirements - accurate, reproducible results with full documentation for compliance, R&D, and quality control programs.

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    Dual Beam FIB SEM Testing Services

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    What Is Dual Beam FIB SEM?

    Dual Beam – Focused Ion Beam (FIB) is a sophisticated microscopy technique that incorporates a focused ion beam and a scanning electron microscope (SEM) in a single tool. With this tool, precise material removal and cross-sectioning of micro and nanostructures are possible.

    Dual beam Focused Ion Beam tools are utilized in various applications, ranging from materials and semiconductor analysis to nanotechnology and failure analysis. The tool is utilized to mill or modify a material’s surface with an ion beam and to provide detailed imaging of structures with an electron beam.

    Applications and Benefits of Dual Beam FIB SEM Testing

    Scope

    Dual Beam FIB analysis enables precise material removal, cross-section preparation, and nanoscale imaging for detailed structural investigation. The technique is particularly useful for examining internal structures and performing site-specific sample preparation.

    The scope includes:

    • Micro and nanoscale material modification

    • Cross-section preparation of samples

    • Imaging of internal microstructures

    • Analysis of semiconductor and electronic devices

    • Preparation of TEM lamella samples

    Applications

    • Semiconductor device failure analysis

    • Nanotechnology and microelectronics research

    • Materials science investigations

    • Microstructure and interface analysis

    • TEM sample preparation

    Benefits

    • Enables precise nanoscale milling

    • Provides high-resolution imaging

    • Allows site-specific sample preparation

    • Combines imaging and machining in one system

    • Supports advanced materials characterization

    Our Testing Procedure

    Sample Preparation

    The specimen is mounted and positioned in the dual beam chamber for analysis.

    1

    Ion Beam Milling

    A focused ion beam removes material from the sample to expose internal structures or prepare cross-sections.

    2

    Electron Beam Imaging

    The scanning electron beam captures high-resolution images of the exposed surfaces.

    3

    Data Analysis

    The images and structural information are analyzed to evaluate material properties or detect defects.

    4

    Test parameters and requirements

    ParameterDetails
    Technique TypeDual beam microscopy
    Ion SourceGallium ion beam
    Imaging MethodScanning electron microscopy
    ResolutionNanometer-scale imaging capability
    Operation ModeMilling, imaging, and sample preparation
    • Dual Beam FIB-SEM System

    • Focused Ion Beam Source

    • Scanning Electron Microscope (SEM)

    • Sample Stage and Chamber

    • Image Processing Software

    Equipment and Instrumentation Used for Testing

    What You Receive: Test Report, Data, and Certification

    • High-resolution microstructure images

    • Cross-sectional analysis reports

    • Defect and failure analysis results

    • Nanoscale structural characterization

    • Detailed technical analysis repor

    Dual Beam FIB SEM FAQs

    Dual Beam FIB is an advanced microscopy technique that combines a focused ion beam for precise material removal with a scanning electron microscope for high-resolution imaging and nanoscale structural analysis.

    The focused ion beam is used to mill, cut, or remove material from a sample surface, enabling researchers to expose internal structures and prepare precise cross-sections for analysis.

    Unlike a conventional SEM, Dual Beam FIB systems include both an ion beam and an electron beam, allowing simultaneous material modification and high-resolution imaging within the same instrument.

    Dual Beam FIB enables precise cross-sectioning of microelectronic devices, allowing engineers to examine internal layers, detect defects, and investigate failures in semiconductor components.

    Dual Beam FIB systems provide nanoscale resolution imaging and precise material removal, enabling researchers to study microstructures and defects at extremely small dimensions.

    Why Choose Infinita Lab for Dual Beam FIB SEM Testing

    When your Dual Beam FIB SEM results have to hold up - for compliance, a customer audit, or an engineering decision - accuracy and an unbiased third-party report matter more than price. Infinita Lab routes your dual beam FIB SEM testing to ISO/IEC 17025-accredited U.S. partner labs with hands-on method experience, so you get defensible data, transparent reporting, and turnaround times built around your project deadline - not ours.

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    Looking for an Accredited Partner for Dual Beam FIB SEM Testing?

    Send query us at hello@infinitalab.com or call us at (888) 878-3090 to learn more about our services and how we can support you.

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    Request a Quote

    Submit your material details and receive testing procedures, pricing, and turnaround time within 24 hours.



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