Case Study: HRTEM Imaging of ALD Thin Films at Atomic Resolution
Isotropic etch profiles are crucial for semiconductors. This case study done by Infinitalab reports highly accurate and statistically significant measurement of sub-nanometer level thickness variations to evaluate the etch profile uniformity of atomic layer deposited (ALD) films, by HRTEM imaging.
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- Overview
- Scope, Applications, and Benefits
- Test Process
- Specifications
- Instrumentation
- Results and Deliverables
Overview
High-Resolution Transmission Electron Microscopy (HRTEM) is a powerful characterization tool that uses a high-energy electron beam to produce images of a material’s internal structure at the atomic scale. With a resolution below 1 Ångström, HRTEM enables direct observation of crystal lattice planes, grain boundaries, defects, interfaces, and nanostructural features that cannot be observed by any other imaging tool. When coupled with other techniques such as SAED, STEM, EDS, and EELS, it gives a comprehensive understanding of both structural and compositional properties at the nanoscale.
HRTEM is a powerful tool in the analysis and characterization of semiconductors, advanced ceramics, metals, nanoparticles, catalysts, films, and biomaterials. It finds application in failure analysis, material development, quality verification, and research in which understanding the material’s atomic structure is directly related to macroscopic properties and reliability.
Scope, Applications, and Benefits
Scope
HRTEM covers atomic to nanoscale structural characterisation of crystalline and amorphous materials across a broad range of industrial and research applications.
- Atomic-resolution imaging of crystal lattices, defects, dislocations, and grain boundaries
- Phase identification and crystal structure determination via selected area electron diffraction (SAED)
- Elemental mapping and compositional analysis using EDS and EELS
- Nanoparticle size, morphology, and crystallinity characterisation
- Thin film layer thickness, interface quality, and epitaxial alignment assessment
- Applicable to metals, ceramics, semiconductors, polymers, catalysts, and biological specimens
Applications
Nanomaterials and nanotechnology research
Semiconductor and electronic materials
Metallurgy and alloy analysis
Polymer nanocomposites
Failure analysis and defect investigation
Benefits
Atomic-level resolution imaging
Direct visualization of lattice structures
Identification of nanoscale defects
Supports advanced material development
Enhances understanding of structure–property relationships
Test Process
Specimen Preparation
Sample thinned to electron transparency (<100 nm) by FIB, ion milling, or ultramicrotomy.
1Instrument Setup & Alignment
Electron beam aligned, accelerating voltage set, and specimen positioned at eucentric height.
2Imaging & Data Acquisition
HRTEM images, SAED patterns, STEM maps, and EDS/EELS spectra acquired from regions of interest.
3Analysis & Reporting
Images processed; lattice spacings, phases, and compositional data interpreted and documented.
4Technical Specifications
| Parameter | Details |
|---|---|
| Technique Type | Transmission Electron Microscopy (High-Resolution Mode) |
| Resolution | Up to ~0.1–0.2 nm (atomic scale) |
| Sample Thickness | Typically below 100 nm |
| Accelerating Voltage | 80 kV to 300 kV (or higher) |
| Magnification Range | Up to millions of times |
| Analyzed Features | Crystal structure, lattice fringes, defects, grain boundaries |
| Environment | High vacuum |
| Output | High-resolution images and diffraction patterns |
Instrumentation Used for Testing
High-Resolution Transmission Electron Microscope (HRTEM)
Electron Gun (Field Emission Source)
Sample Preparation Equipment (Ion milling, ultramicrotome)
Vacuum System
Image Processing Software
Results and Deliverables
Atomic-scale images of materials
Lattice structure and crystallographic analysis
Defect and dislocation identification
Grain boundary and phase analysis
Detailed microscopy report
Frequently Asked Questions
HRTEM is an advanced imaging technique that uses electron beams to visualize atomic structure in materials at a resolution of up to 0.5 Å (0.05 nm). The resolution achieved has already probed details concerning crystal structures, defects, and atomic arrangements.
HRTEM obtains high resolution using the high-energy electron beam (200–300 keV) passing through a thin sample interacting with its atoms. Phase contrast and advanced lens systems
HRTEM provides high-resolution images, but sample preparation can modify the material to some extent. It is also primarily applicable for thin samples and could be better for more extensive bulk materials. Sample damage due to the high-energy electron beam also constitutes another limiting factor.
Yes, while HRTEM can be combined with complementary techniques such as EELS for further chemical and elemental analysis, it allows the study of the material not only at atomic-scale resolution but also its atomic-level chemistry composition.
HRTEM offers detailed structural information necessary for the design and process optimization of advanced materials, especially in nanotechnology, semiconductor research, and materials science. It is helpful for defect imaging, tailoring, and understanding material properties when designing new materials and devices.
Why Choose Infinita Lab for Advanced Materials Testing and Characterization?
At the core of this breadth is our network of 2,000+ accredited laboratories across the USA, offering access to over 10,000 testing methods and analytical services. From advanced materials characterization (SEM, TEM, RBS, XPS) to mechanical, chemical, environmental, biological, and standardized ASTM/ISO-compliant testing, we deliver unmatched flexibility, specialization, and scale. You are never limited by geography, facility, or methodology — Infinita Lab connects you to the right expertise and testing solution, every time.
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